Applied Materials to introduce a new system for Atomic Layer Deposition - Olympia™ ALD

BALD Engineering reports: Applied Materials to introduce a new system for Atomic Layer Deposition - Olympia™ ALD, read the full article here

Lam Research Releases High-Productivity VECTOR(R) ALD Oxide Deposition System

BALD Engineering Reports: Lam Research Releases High-Productivity VECTOR(R) ALD Oxide Deposition System, Read the full article here

Hamamatsu Licenses Arradiance®, Inc. Nanofilm Technology Portfolio

Hamamatsu Photonics K.K., one of the world’s leading producers of photodetectors and imagers today announced that it has licensed certain Arradiance....

Argonne chooses Beneq’s TFS 500 Atomic Layer Deposition System

The Beneq TFS 500 system has offered exceptional modularity and flexibility, allowing Argonne to continue driving breakthroughs in energy technology...

SENTECH Seminar on Plasma Process Technology 2015

SENTECH has organized a seminar on Plasma Process Technology on March 5th 2015, held at SENTECH Instruments in Berlin Adlershof..

Chinese Ambassador visits SENTECH

The Chinese ambassador in Germany, His Excellency Shi Mingde visited SENTECH Instruments GmbH on Friday, 10th of March 2015...

Picosun ALD protects printed circuit boards

Picosun Oy develops a novel, production-scale method for PCB protection, under a contract with the European Space Agency (ESA)...


SENTEC at SEMICON CHINA 2015, the Chinese SENTECH user community and guests met at the representative SENTECH stand....

Picosun expands its production capacity

Picosun Oy doubles its production capacity to enable faster delivery of cluster systems and automated batch ALD tools to its customers...

Levitech BV sells two Levitrack® ALD Systems

Levitech BV sells two Levitrack® ALD Systems to a major Japanese multinational...

ALD R&D Equipment Chart

ALD Pulse has put together, with the input and feedback from various manufacturers of ALD equipment, the ALD R&D EQUIPMENT CHART

Arradiance® Introduces Their GEMstar XT-P™

Arradiance® Introduces Their GEMstar XT-P™, the First Benchtop Thermal and Plasma-Enhanced ALD System for Research

ALD Pulse Interviews: Paul Poodt, Program manager Spatial ALD at Holst Centre / TNO

ALD Pulse had the honour to interview Paul Poodt, Program manager Spatial ALD at Holst Centre / TNO.

 Watch the interview.                                                                 

Three investments in France to accelerate the Group’s innovation

03/14/2014 Air Liquide has just decided on three investments in France to help accelerate the Group’s innovation and explore new markets. These three initiatives represent an investment of nearly €100 million.

SUNY CNSE, G450C, Quad-C… Albany rising!

The birth of SUNY CNSE (College of Nanoscale Science and Engineering), The G450C (Global 450 Consortium) The first step towards the Quad-C (Computer Chip Commercialization Center), all seems to be going well in Albany. Here is what President Obama thinks of it all.

PhD position on Advanced ALD

PhD position on Advanced ALD. The Electro-Optical Communication Systems (ECO) group, Department of Electrical Engineering of the Eindhoven University of Technology 

Global Atomic Layer Deposition Market 2012-2016

 TechNavio's report, the Global Atomic Layer Deposition Market 2012-2016, has been prepared based on an in-depth market analysis with inputs from industry experts. The report covers the Americas, and the EMEA and APAC regions; it also covers the Global Atomic Layer Deposition market landscape and its growth prospects in the coming years......

Publication plan for the virtual project on the history of ALD 2.0

This is the updated version 2.0 to the publication plan of the “virtual project on the history of ALD”, introduction of which and invitation to participate can be found here and introductory slides from hereThe goals of the publication plans are...

Virtual Project, "History of ALD"

Introduction and invitation to participate, Riikka Puurunen (Dr.), Senior Scientist, VTT Finland. Aziz Abdulagatov (Dr.), Postdoctoral Fellow, NIST, USA. Jonas Sundqvist (Dr.), Group Leader, Fraunhofer.IPMS-CNT, Germany. Annina Titoff, Editor in Chief ALD Pulse, Finland.

Toward atomically-precise synthesis of supported bimetallic nanoparticles using ALD

Multi-metallic nanoparticles constitute a new class of materials offering the opportunity to tune the properties via the composition.....